Lighting system for illuminating a predetermined illumination area of ​​the object surface by the EUV radiation

摘要

PROBLEM TO BE SOLVED: To increase the throughput by a specified size EUV, or reduce the size by a predetermined EUV throughput of a conventional illumination system used for EUV illuminating a mask or a reticle form object, and a projection exposure system provided therewith, in a micro-lithography for manufacturing an integrated circuit.;SOLUTION: The illumination system has a collector for focusing the EUV irradiation into the direction of an optical axis, a first optical element 10 for generating a secondary optical source, a secondary optical element 11 arranged in the secondary optical source position, and further optical elements not more than five total 10, 11, 13, 14 and 15 between a collector and the illumination region. The optical element and the optical axis are crossed with an incident angle not less than 60° and not larger than 30°. At least an axial portion of the optical axis inclines for a lighting primary plane 18 at least between two optical elements 11.;COPYRIGHT: (C)2008,JPO&INPIT