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Crystal growth apparatus, the nitride-based compound semiconductor crystal and a method of manufacturing a nitride-based compound semiconductor crystal

机译:晶体生长设备,氮化物基化合物半导体晶体和制造氮化物基化合物半导体晶体的方法

摘要

Crystal growth apparatus which can be useful in growing a nitride semiconductor crystal by hydride vapor phase epitaxy, it is possible to effectively prevent breakage of the reaction tube, to grow a high quality nitride-based semiconductor single crystal, the providing a nitride-based compound semiconductor crystal, and a method of producing a nitride-based compound semiconductor crystal using the crystal growth apparatus. In the crystal growing apparatus of the horizontal type by using hydride vapor phase epitaxy to grow a nitride compound semiconductor crystal on a base substrate, the side which is disposed the source gas supply pipe the reaction tube (11) (14, 15) end of the (upstream flange 11a), during (substrate holder 13), I provided plurality of partition plates for partitioning in the axial direction the reaction tube (20) installation position of the underlying substrate.
机译:可以用于通过氢化物气相外延生长氮化物半导体晶体的晶体生长设备,可以有效地防止反应管破裂,生长高质量的氮化物基半导体单晶,提供氮化物基化合物半导体晶体,以及使用该晶体生长设备制造氮化物基化合物半导体晶体的方法。在利用氢化物气相外延在基底基板上生长氮化物化合物半导体晶体的卧式晶体生长装置中,在配置有原料气体供给管的一侧的反应管(11)(14、15)的端部。 (上游凸缘11a)中,在(基板保持器13)的过程中,设置有多个隔板,用于在轴向上划分下层基板的反应管(20)的安装位置。

著录项

  • 公开/公告号JPWO2011108640A1

    专利类型

  • 公开/公告日2013-06-27

    原文格式PDF

  • 申请/专利权人 JX日鉱日石金属株式会社;

    申请/专利号JP20120503243

  • 发明设计人 森岡 理;

    申请日2011-03-03

  • 分类号C30B29/38;C30B25/14;C23C16/455;H01L21/205;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:21

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