首页> 外国专利> SUBSTRATE USED FOR CRYSTAL GROWTH OF NITRIDE-BASED COMPOUND SEMICONDUCTOR, AND METHOD FOR CRYSTAL GROWTH OF NITRIDE-BASED COMPOUND SEMICONDUCTOR

SUBSTRATE USED FOR CRYSTAL GROWTH OF NITRIDE-BASED COMPOUND SEMICONDUCTOR, AND METHOD FOR CRYSTAL GROWTH OF NITRIDE-BASED COMPOUND SEMICONDUCTOR

机译:用于氮化物基复合半导体晶体生长的基质,以及用于氮化物基复合半导体晶体生长的方法

摘要

PROBLEM TO BE SOLVED: To provide a substrate used for crystal growth of a nitride-based compound semiconductor, which can make the crystal quality of the target nitride-based compound semiconductor uniform in a surface of a substrate by reducing generation of a distribution of growth temperature in the surface of the substrate; and to provide a method for crystal growth of the nitride-based compound semiconductor.;SOLUTION: The substrate used for crystal growth of the nitride-based compound semiconductor is characterized by having an infrared absorption layer 2, e.g. a carbon film on a surface of a substrate 1 for crystal formation, e.g. an Si(111) substrate on the opposite side to a side where crystal growth is made.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种用于氮化物基化合物半导体的晶体生长的衬底,其可以通过减少生长分布的产生来使目标氮化物基化合物半导体的晶体质量在衬底表面中均匀。基板表面的温度; ;解决方案:用于氮化物基化合物半导体的晶体生长的衬底的特征在于具有红外吸收层2,例如氮化硅。例如,在用于形成晶体的基板1的表面上的碳膜。 Si(111)基板,与进行晶体生长的一侧相反。版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP2010056129A

    专利类型

  • 公开/公告日2010-03-11

    原文格式PDF

  • 申请/专利权人 NIPPON TELEGR & TELEPH CORP NTT;

    申请/专利号JP20080216606

  • 发明设计人 KOBAYASHI TAKASHI;ODA YASUHIRO;

    申请日2008-08-26

  • 分类号H01L21/205;C23C16/02;

  • 国家 JP

  • 入库时间 2022-08-21 19:05:32

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