Method for producing a transparent cured film using a half exposure positive photosensitive resin layer

摘要

Method of producing a transparent cured film with an exposure wide margin, while maintaining the present invention relates sensitive, inter alia, in the transflective liquid crystal display device, applicable to the production of TFT flattening film, in particular, the half exposure to provide a method for producing a transparent cured film for simultaneously forming a reflection irregularities and contact holes. SOLUTION: A substrate, in such a manner that the positive photosensitive resin layer having a low sensitivity is located in the positive photosensitive resin layers of high sensitivity and the substrate a positive photosensitive resin layer of two layers with different exposure sensitivity method for producing a transparent cured film, characterized in that it comprises a step of laminating to, exposing the positive photosensitive resin layer is heated after exposure, development, post-baked. And a display device having a transparent cured film obtained by such a method. None [Selection Figure]