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Semiconductor Device With an Oversized Local Contact as a Faraday Shield

机译:具有超大局部触点作为法拉第屏蔽的半导体器件

摘要

This application is directed to a semiconductor device with an oversized local contact as a Faraday shield, and methods of making such a semiconductor device. One illustrative device disclosed herein includes a transistor comprising a gate electrode and a source region, a source region conductor that is conductively coupled to the source region, a Faraday shield positioned above the source region conductor and the gate electrode and a first portion of a first primary metallization layer for an integrated circuit device positioned above and electrically coupled to the Faraday shield.
机译:本申请针对具有超大局部接触作为法拉第屏蔽的半导体器件及其制造方法。本文公开的一个说明性装置包括:晶体管,其包括栅电极和源极区;与源极区导电耦合的源极区导体;法拉第屏蔽层,其位于源极区导体和栅电极上方;以及第一晶体管的第一部分。集成电路器件的第一金属化层位于法拉第屏蔽上方并与法拉第屏蔽电耦合。

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