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Mask Set for Double Exposure Process and Method of Using the Mask Set
Mask Set for Double Exposure Process and Method of Using the Mask Set
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机译:用于两次曝光过程的光罩组和使用光罩组的方法
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摘要
A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.
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