首页> 外国专利> METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE

METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE

机译:制备薄膜晶体管基片的方法和在薄膜晶体管基片中使用的光敏组合物

摘要

Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
机译:公开了一种具有高的光敏性,耐热性,耐冲击性的薄膜晶体管基板的制造方法以及由其使用的感光性组合物,该方法包括在绝缘基板上形成数据线,在绝缘基板上形成有机绝缘膜。通过施加包含三元共聚物的光敏组合物来形成数据线,其中三元共聚物衍生自不饱和羧酸,不饱和羧酸酐或其混合物,不饱和含环氧基的化合物和烯烃化合物的单体。

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