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Method of manufacturing electroforming mold, electroforming mold, and method of manufacturing electroformed component

机译:电铸模具的制造方法,电铸模具以及电铸零件的制造方法

摘要

In a method of manufacturing an electroforming mold, a first photoresist layer is formed on an upper surface of a bottom conductive film of a substrate, and the first photoresist layer is divided into a first soluble portion and a first insoluble portion. A conductive material is thermally deposited on an upper surface of the first photoresist layer within a predetermined temperature range, to thereby form an intermediate conductive film. An intermediate conductive film is patterned. A second photoresist layer is formed on an exposed upper surface of the first photoresist layer after the intermediate conductive film is removed, and on an upper surface of the intermediate conductive film remaining after patterning. The second photoresist layer is divided into a second soluble portion and a second insoluble portion. Next, the first and second photoresist layers are developed, and the first and second soluble portions are removed.
机译:在制造电铸模具的方法中,在基板的底部导电膜的上表面上形成第一光致抗蚀剂层,并且将第一光致抗蚀剂层分为第一可溶部分和第一不溶部分。在预定温度范围内将导电材料热沉积在第一光刻胶层的上表面上,从而形成中间导电膜。中间导电膜被图案化。在去除中间导电膜之后,在第一光刻胶层的暴露的上表面上以及在图案化之后剩余的中间导电膜的上表面上形成第二光刻胶层。第二光刻胶层分为第二可溶部分和第二不溶部分。接下来,显影第一和第二光刻胶层,并且去除第一和第二可溶部分。

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