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Improvement of thickness deposition uniformity in nickel electroforming for micro mold inserts

机译:改善微模具嵌件镍电铸中厚度沉积的均匀性

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Thickness deposition is a crucial issue on the application of electroformed micro mold inserts. Edge concentration effect is the main source of the non-uniformity. The techniques of adopting a non-conducting shield, a secondary electrode and a movable cathode were explored to improve the thickness deposition uniformity during the nickel electroforming process. Regarding these techniques, a micro electroforming system with a movable cathode was particularly developed. The thickness variation of a 16 mm×16 mm electroformed sample decreased respectively from 150% to 35%, 12% and 18% by these three techniques. Combining these validated methods, anickelmold insert for microlens array was electroformed with satisfactory mechanical properties and high replication precision. It could be applied to the following injection molding process.
机译:厚度沉积是电铸微模具嵌件应用中的关键问题。边缘集中效应是不均匀性的主要来源。为了提高镍电铸过程中的厚度沉积均匀性,探索了采用非导电屏蔽,次级电极和可移动​​阴极的技术。关于这些技术,特别开发了具有可移动阴极的微电铸系统。通过这三种技术,16 mm×16 mm电铸样品的厚度变化分别从150%降至35%,12%和18%。结合这些经过验证的方法,用于电铸微透镜阵列的ickelmold插件具有令人满意的机械性能和高复制精度。它可以应用于后续的注塑工艺。

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