首页> 外国专利> Lateral extended drain metal oxide semiconductor field effect transistor (LEDMOSFET) with tapered dielectric plates to achieve a high drain-to-body breakdown voltage, a method of forming the transistor and a program storage device for designing the transistor

Lateral extended drain metal oxide semiconductor field effect transistor (LEDMOSFET) with tapered dielectric plates to achieve a high drain-to-body breakdown voltage, a method of forming the transistor and a program storage device for designing the transistor

机译:具有锥形介电板的横向扩展漏极金属氧化物半导体场效应晶体管(LEDMOSFET),以实现高的漏-体击穿电压,形成该晶体管的方法和用于设计该晶体管的程序存储装置

摘要

A lateral, extended drain, metal oxide semiconductor, field effect transistor (LEDMOSFET) with a high drain-to-body breakdown voltage (Vb) incorporates gate structure extensions on opposing sides of a drain drift region. The extensions are tapered such that a distance between each extension and the drift region increases linearly from one end adjacent to the channel region to another end adjacent to the drain region. In one embodiment, these extensions can extend vertically through the isolation region that surrounds the LEDMOSFET. In another embodiment, the extensions can sit atop the isolation region. In either case, the extensions create a strong essentially uniform horizontal electric field profile within the drain drift. Also disclosed are a method for forming the LEDMOSFET with a specific Vb by defining the dimensions of the extensions and a program storage device for designing the LEDMOSFET to have a specific Vb.
机译:具有高的漏-体击穿电压(Vb)的横向,扩展的漏极,金属氧化物半导体场效应晶体管(LEDMOSFET)在漏极漂移区的相对侧结合了栅极结构扩展。延伸部是渐缩的,使得每个延伸部与漂移区之间的距离从与沟道区相邻的一端到与漏极区相邻的另一端线性增加。在一实施例中,这些延伸部可垂直延伸穿过围绕LEDMOSFET的隔离区。在另一个实施例中,延伸部可以位于隔离区域的顶部。在任一种情况下,延伸部在漏极漂移内产生强的,基本上均匀的水平电场分布。还公开了一种通过定义延伸部的尺寸来形成具有特定Vb的LEDMOSFET的方法以及用于将LEDMOSFET设计为具有特定Vb的程序存储装置。

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