首页> 外国专利> METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER WITH SEMICONDUCTOR ELEMENT, METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER LAMINATED BODY

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER WITH SEMICONDUCTOR ELEMENT, METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER LAMINATED BODY

机译:制造半导体器件的方法,制造具有半导体元件的半导体晶片的方法,制造具有粘性层的半导体晶片的方法以及制造半导体晶片层叠体的方法

摘要

Provided is a method for manufacturing a semiconductor device comprising: a step for applying a liquid photosensitive adhesive to the circuit side of a semiconductor wafer having a circuit side in which a metal bump is formed, to form a photosensitive adhesive layer; a step for B-staging the photosensitive adhesive layer by light irradiation to obtain a semiconductor wafer with an adhesive layer; a step for cutting the semiconductor wafer of the semiconductor wafer with the adhesive layer, together with the adhesive layer, into a plurality of semiconductor elements to obtain semiconductor elements with an adhesive layer; and a step for crimping the semiconductor elements with the adhesive layer and other semiconductor elements or the support component for mounting the semiconductor elements across the adhesive layer of the semiconductor elements with the adhesive layer.
机译:本发明提供一种半导体装置的制造方法,其包括:在具有形成有金属凸块的电路侧的半导体晶片的电路侧涂布液态的感光性粘接剂而形成感光性粘接剂层的工序;通过光照射对感光性粘合剂层进行B阶化的步骤,以获得具有粘合剂层的半导体晶片;将具有粘接剂层的半导体晶片的半导体晶片与粘接剂层一起切割成多个半导体元件,得到具有粘接剂层的半导体元件的工序。压接具有粘合层和其他半导体元件的半导体元件或用于将半导体元件安装在具有粘合层的半导体元件的粘合层上的支撑部件的步骤。

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