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Laser annealing device and laser annealing method using a pulsed laser diode

机译:使用脉冲激光二极管的激光退火装置和激光退火方法

摘要

A generil pulse waveform rises sharply from a starting time point of oscillation, shows a peak, and thereafter, decreases gently. At the time point when power shows a peak, the surface of an annealing object (30) is sharply heated and reaches a high temperature. Since time showing the peak is an instant, it is difficult to sufficiently heat a deep region of an annealing object (30). A laser pulse is emitted from a laser diode (12) when a pulse current is input. An optical system (13,15,16,19,20) that guides a laser beam emitted from the laser diode (12) to an annealing object (30). A driver (10) supplies a pulse current that has a time waveform of a top flat and a pulse width of 1 µs to 100 µs to the laser diode (12).
机译:普通脉冲波形从振荡的开始时间点开始急剧上升,出现一个峰值,然后缓慢下降。在功率达到峰值的时间点,退火物体(30)的表面被急剧加热并达到高温。由于示出峰值的时间是瞬间,因此难以充分加热退火物体(30)的深部区域。当输入脉冲电流时,从激光二极管(12)发出激光脉冲。将从激光二极管(12)发射的激光束引导至退火物体(30)的光学系统(13、15、16、19、20)。驱动器(10)向激光二极管(12)提供具有顶部平坦的时间波形和1μs至100μs的脉冲宽度的脉冲电流。

著录项

  • 公开/公告号EP2574418A1

    专利类型

  • 公开/公告日2013-04-03

    原文格式PDF

  • 申请/专利权人 SUMITOMO HEAVY INDUSTRIES LTD.;

    申请/专利号EP20120006381

  • 发明设计人 WAKABAYASHI NAOKI;YOROZU MASAFUMI;

    申请日2012-09-11

  • 分类号B23K26;B23K26/06;H01L21/265;H01L21/268;B23K26/073;

  • 国家 EP

  • 入库时间 2022-08-21 16:30:13

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