METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS BY NEGATIVE TONE DEVELOPMENT

摘要

PURPOSE: A method for forming a photolithographic pattern by negative tone development is provided to improve CD integration, pattern collapse margin, focus allowance, and exposure allowance instead of a positive tone photolithography technique. CONSTITUTION: A substrate including layers to be patterned is provided. A photoresist composite layer is coated on the layers. The photoresist composite layer is exposed by chemical irradiation with a pattern type. The photoresist composite layer is heated in a baking process. The photoresist composition layer is developed with an organic solvent developer to form a photoresist pattern. [Reference numerals] (AA) Thickness(A); (BB) Resist composite 13; (CC) Resist composite 14; (DD) Dose amount(mJ/cm2)