MULTI-ZONE RESISTIVE HEATING APPARATUS, A REACTOR COMBINED WITH THE SAME, A HEATING SYSTEM FOR A CHEMICAL VAPOR DEPOSITION APPARATUS, AND A METHOD FOR HEATING A RESISTANCE OF A SUBSTRATE

摘要

PURPOSE: A multi-zone resistive heating apparatus, a reactor combined with the same, a heating system for a chemical vapor deposition apparatus and a method for heating a resistance of a substrate are provided to enhance process repeatability by compensating the non-uniformity of heating.;CONSTITUTION: A shaft(30) is combined with a stage(20). A first heating element is arranged in the center of a body of the stage. A second heating element and a third heating element are arranged in the body of the stage. The second heating element and the third heating element partially surround the first heating element. The second heating element is adjacent to the third heating element.;COPYRIGHT KIPO 2013