MULTI-ZONE RESISTIVE HEATING APPARATUS, REACTOR COUPLED TO MULTI-ZONE RESISTIVE HEATING APPARATUS, HEATING SYSTEM FOR CHEMICAL VAPOR DEPOSITION SYSTEM, AND RESISTIVE HEATING METHOD FOR SUBSTRATE

摘要

An apparatus, a reactor, and a method for heating a substrate are disclosed. The apparatus comprises: a stage including a body and a surface having an area for supporting a substrate; a shaft which is coupled to the stage; a first heating element which is disposed in the center area of the body of the stage; and at least second and third heating elements which are disposed in the body of the stage, wherein each of at least the second and third heating elements partially surround the first heating element, and at least the second and third heating elements are adjacent in the circumferential direction.;COPYRIGHT KIPO 2016