MULTI-ZONE RESISTIVE HEATING APPARATUS REACTOR INCORPORATING THE MULTI-ZONE RESISTIVE HEATING APPARATUS HEATING SYSTEM FOR A CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR RESISTIVE HEATING OF SUBSTRATE

摘要

Apparatus, reactor, and method for heating a substrate are disclosed. The apparatus includes a stage having a surface having a region for supporting a substrate and a body, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, Wherein said at least second and third heating elements each partially surround said first heating element and said at least second and third heating elements are circumferentially adjacent to one another.;