MANUFACTURING METHOD OF A POLYMER COMPOUND SUITABLE AS A BASE COMPONENT OF A PHOTORESIST COMPOSITION FORMING A RESIST PATTERN WITH GOOD LITHOGRAPHY PROPERTY, A RESIST COMPOSITION, AND A FORMING METHOD OF A RESIST PATTERN

摘要

PURPOSE: A manufacturing method of a polymer compound is provided to manufacture a polymer compound having a sulfonium or iodine cation by using the acid dissociation constant (pKa) of a conjugated acid.;CONSTITUTION: A manufacturing method of a polymer compound having a structure unit forming acid by being decomposed by light exposure comprises a step of obtaining a second precursor polymer with a second ammonium cation, which is the conjugated acid of the amine by conducting the reaction between a first precursor polymer with a first ammonium cation and an amine the acid dissociation constant (pKa) of the conjugated acid is higher than that of the first ammonium cation; and a step of salt-exchanging the second precursor polymer, a sulfonium cation, or an iodonium cation. The second ammonium cation has a lower hydrophobicity than that of the first ammonium cation and has a lower hydrophobicity than those of the iodonium cation or sulfonium cation.;COPYRIGHT KIPO 2013