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atmospheric thin film treatment apparatus, thin film treatment method, repair line and substrate using thereof

机译:大气薄膜处理设备,薄膜处理方法,修复线和使用其的基板

摘要

An atmospheric thin film treatment apparatus, a thin film treatment method, a repair line, and a substrate using the repair line are provided to increase a manufacturing speed of a flat panel display device by increasing a deposition speed of the repair line. An atmospheric thin film treatment apparatus includes a stage(110), a gas shield(120), an energy source(140), and a reaction gas supply unit(150). Substrates are mounted on the stage. The gas shield is arranged on the stage and includes a retention hole and two supply paths, which are coupled with the retention hole. The energy source is arranged on the gas shield and illuminates a laser beam on the substrate through the retention hole. The reaction gas supply unit sequentially or simultaneously supplies different reaction gases on the supply paths.
机译:提供一种大气薄膜处理设备,薄膜处理方法,修复线以及使用该修复线的基板,以通过增加修复线的沉积速度来提高平板显示装置的制造速度。大气薄膜处理装置包括台架(110),气罩(120),能量源(140)和反应气体供应单元(150)。将基板安装在平台上。气罩布置在平台上并且包括保持孔和与保持孔联接的两个供应路径。能量源布置在气罩上,并通过保持孔将激光束照射在基板上。反应气体供应单元在供应路径上顺序或同时供应不同的反应气体。

著录项

  • 公开/公告号KR101221949B1

    专利类型

  • 公开/公告日2013-01-15

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20050035926

  • 发明设计人 이종철;박상혁;

    申请日2005-04-29

  • 分类号H01L21/28;

  • 国家 KR

  • 入库时间 2022-08-21 16:25:55

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