CHEMICAL VAPOR DEPOSITION DEVICE, GUIDE MEMBER FOR THE CHEMICAL VAPOR DEPOSITION DEVICE AND METHOD FOR MANUFACTURING THIN FILM USING THE CHEMICAL VAPOR DEPOSITION DEVICE

摘要

The entire design and production of chemical vapor deposition apparatus when the recirculating exhaust gas flow phenomenon occurs on the back This configuration can adjust the flow path section between the susceptor and the reaction chamber even if not of the wall is required. The chemical vapor deposition apparatus according to the present invention, the reaction chamber and the chamber is located inside the discharge port is formed, is provided in the reaction chamber and a susceptor in which the substrate is loaded, the discharge of the process gas to the showerhead and discharging the process gas toward the substrate to form a flow path, and a guide member for guiding the process gas to the outlet, the guide member comprises an outer peripheral wall and the chamber provided between the outer periphery of the susceptor. Thin film manufacturing method using a chemical vapor deposition apparatus according to the present invention, comprises the step of replacing a different radius so as to adjust the cross-sectional area of the discharge path having a guide member. The thin film manufacturing method using a chemical vapor deposition apparatus according to the present invention comprises the step of inserting a second guide member between the acceptor and the outer guide member up to regulate the cross-sectional area of the exhaust passage,.