Method of Controlling A Lithographic Apparatus, Device Manufacturing Method, Lithographic Apparatus, Computer Program Product and Method of Improving a Mathematical Model of a Lithographic Process

摘要

A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.