SYSTEM, PROGRAMMABLE ILLUMINATOR, LITHOGRAPHIC APPARATUS, INCIDENT LIGHT RELATED ENERGY PARAMETER DETERMINING METHOD, AND DEVICE MANUFACTURING METHOD

摘要

[0007]Considering the above, it is an object of the invention to provide a system comprising: 1.a micromirror array comprising: 1.1a substrate, 1.2a plurality of moveable micromirrors for reflecting incident light and supported from the substrate, 1.3an actuator system configured to position each of the plurality of micromirrors based on one or more actuator control signals, 1.4a measurement system configured to measure a position of each of the plurality of micromirrors, 1.5a control unit configured to generate the one or more actuator control signals based on an output of the measurement system, 2.a processor, wherein at least some of the micromirrors of the array comprise a temperature sensor configured to measure a temperature of the respective micromirror, and wherein the processor is configured to receive the measured temperatures of the at least some micromirrors and to determine an incident light related energy parameter.[0008] According to an embodiment of the invention, there is provided a programmable illuminator comprising a system according to the invention for conditioning a radiation beam. [0009] According to another embodiment of the invention, there is provided a lithographic apparatus comprising: 1.an illumination system configured to condition a radiation beam, 2.a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, 3.a substrate table constructed to hold a substrate, and 4.a projection system configured to project the patterned radiation beam onto the substrate, wherein the illumination system comprises a system according to the invention. [00010] According to a further embodiment of the invention, there is provided a lithographic apparatus to project a pattern from a patterning device onto a substrate, comprising a programmable illuminator according to the invention for conditioning a radiation beam used to illuminate the patterning device and/or for conditioning a radiation beam used to measure a target structure on the substrate. [00011] According to yet another embodiment of the invention, there is provided an inspection and/or metrology apparatus for conditioning a radiation beam used to measure a target structure on a substrate. [00012] According to yet a further embodiment of the invention, there is provided a method to determine an incident light related energy parameter of a micromirror array, the micromirror array comprising at least some micromirrors for reflecting incident light each of the at least some micromirrors comprising a temperature sensor configured to measure a temperature of the respective micromirror, wherein the method comprises using the measured temperatures to determine an incident light related energy parameter. [00013] According to another embodiment of the invention, there is provided a device manufacturing method wherein use is made of a lithographic apparatus according to the invention.