Plant, useful for treating substrates in horizontal layer, comprises chamber limited at chamber walls, substrate treatment device and transportation unit that is arranged within chamber and comprises arrangement of carrier rollers

摘要

The substrate treatment plant comprises a chamber limited at one of the chamber walls, a substrate treatment device and a transportation unit arranged within the chamber. The transportation unit comprises an arrangement of carrier rollers that are arranged in the transport direction and horizontally aligned to receive substrates in a horizontal substrate plane. The carrier rollers comprise a cylindrical roll body with a cavity (9) in which a heating medium is arranged. The roll body is supported at first and second ends of first and second sealed passages. The substrate treatment plant comprises a chamber limited at one of the chamber walls, a substrate treatment device and a transportation unit arranged within the chamber. The transportation unit comprises an arrangement of carrier rollers that are arranged in the transport direction and horizontally aligned to receive substrates in a horizontal substrate plane. The carrier rollers comprise a cylindrical roll body with a cavity (9) in which a heating medium is arranged. The roll body is supported at first and second ends of first and second sealed passages that are arranged at an aperture of a wall of the plant chamber. The first sealed passage comprises a sleeve shaft (10), by which the heating medium is more insertable from an outer side of the chamber into the cavity of the roll body. The heating medium and the roll body are mechanically decoupled. The heating medium is connected with a part of the first sealed passage that is firmly connected with the wall of the chamber. The second sealed passage is more drivable by a drive device (8) that is arranged outside of the chamber.