首页> 外国专利> Metal-oxide-semiconductor transistor, has semiconductor zones with same conductivity connected with same conductivity of drain and source areas, and extended in substrate so as to couple two adjacent portions of channel in electrically

Metal-oxide-semiconductor transistor, has semiconductor zones with same conductivity connected with same conductivity of drain and source areas, and extended in substrate so as to couple two adjacent portions of channel in electrically

机译:金属氧化物半导体晶体管,具有导电性相同的半导体区域,其漏极和源极区域的导电性相同,并且在衬底中延伸,以电耦合沟道的两个相邻部分。

摘要

The transistor has a semiconductor substrate (2) comprising a source area (3) and a drain area (4). A gate (7) is placed above the substrate between the source and drain areas. The gate is segmented with two gate segments (8), where each segment of the gate controls a portion of a channel in the substrate. The segments of the gate are electrically connected with each other. Semiconductor zones (9) with same conductivity are connected with the same conductivity of the drain and the source areas and extended in the substrate so as to couple two adjacent portions of the channel electrically.
机译:该晶体管具有包括源极区(3)和漏极区(4)的半导体衬底(2)。栅极(7)放置在源极和漏极区域之间的衬底上方。栅极被两个栅极段(8)分段,其中栅极的每个段控制衬底中沟道的一部分。栅极的各段彼此电连接。具有相同电导率的半导体区(9)以漏极和源极区的相同电导率连接,并在衬底中延伸,以电耦合沟道的两个相邻部分。

著录项

  • 公开/公告号FR2982420A1

    专利类型

  • 公开/公告日2013-05-10

    原文格式PDF

  • 申请/专利权人 STMICROELECTRONICS SA;

    申请/专利号FR20110059952

  • 发明设计人 HNIKI SAADIA;PELLOUX NICOLAS;

    申请日2011-11-03

  • 分类号H01L29/78;

  • 国家 FR

  • 入库时间 2022-08-21 16:21:00

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