ROUGH POLISHING ABRASIVE COMPOSITION, METHOD FOR POLISHING MAGNETIC DISK SUBSTRATE, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND MAGNETIC DISK SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a rough polishing abrasive composition capable of reducing the edge face sag (roll-off) of a substrate after polishing as well as also capable of preventing an extreme drop in polishing rate compared to the existing abrasive composition said to offer a good edge face shape, and also to provide a method for polishing a magnetic disk substrate using the rough polishing abrasive composition, a method for producing a magnetic disk substrate using the rough polishing abrasive composition, and a magnetic disk substrate.;SOLUTION: The rough polishing abrasive composition comprises abrasive material, one or more selected from acids and/or salts thereof, oxidizer, roll-off reducing agent that reduces roll-off, and water. The roll-off reducing agent is a sulfonic acid-based anionic surfactant and/or sulfuric acid ester-based anionic surfactant, and the anionic surfactants have amide structures.;COPYRIGHT: (C)2015,JPO&INPIT