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Heating device, the substrate processing apparatus, substrate processing method and a method of manufacturing a semiconductor device

机译:加热装置,基板处理装置,基板处理方法以及半导体装置的制造方法

摘要

PROBLEM TO BE SOLVED: To reduce contact between a heating element and a heat insulator at the time of thermal expansion of the heating element and reduce damage of components constituting a heating device.;SOLUTION: A heating device comprises an annularly formed heating element, a heat insulator placed around the circumference of the heating element, and a fixing part which fixes the heating element onto an inner wall of the heat insulator. At least when the heating element is at a room temperature, the distance between the heating element and the inner wall of the heat insulator is set to be larger as it moves away from the fixing part.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:在加热元件热膨胀时减少加热元件与绝热体之间的接触并减少构成加热装置的组件的损坏。解决方案:加热装置包括环形形成的加热元件,隔热体设置在发热体的周围,固定部将发热体固定在隔热体的内壁上。至少当加热元件处于室温时,加热元件与绝热体的内壁之间的距离将设置为随着其远离固定部分而变大。;版权所有:(C)2012,JPO&INPIT

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