首页> 外国专利> Catadioptric projection objective having an inclined deflecting mirror , a projection exposure apparatus , a projection exposure method , and a mirror

Catadioptric projection objective having an inclined deflecting mirror , a projection exposure apparatus , a projection exposure method , and a mirror

机译:具有倾斜偏转镜的折反射投射物镜,投射曝光设备,投射曝光方法和反射镜

摘要

Catadioptric projection objective comprising a plurality of optical elements, a projection exposure apparatus, a projection exposure method using such a projection objective, and to provide a mirror. Catadioptric projection objective includes a plurality of optical elements arranged along an optical axis for imaging the array pattern on the object surface of the projection objective onto an image surface of the projection objective. Optical elements, and a concave mirror, the light from the object surface is deflected toward the concave mirror, or a first inclination angle to the first tilt axis light from the concave mirror to deflect toward the image surface includes a first deflecting mirror which is inclined with respect to t 1 by the optical axis and a second deflecting mirror which is inclined to the second inclination angle t 2 only optical axis to a second inclined axis. First deflection mirror is incident on the first deflecting mirror at (t 1 -Δα 1) ≦ α 1 (t 1 + Δα1) first incident angle alpha 1 of the first incident angle range according to the s- a first reflective coating having a reflectivity R p1 (α1) relative to the reflectivity R s 1 (α 1) and p- polarized light to polarized light. Second deflecting mirror is incident on the second deflecting mirror in (t 2 -Δα 2) ≦ α 2 ≦ (t 2 + Δα 2) the second incident angle 02 from the second incident angle range in accordance with the s- a second reflective coating having a reflectivity R p 2 (α 2) with respect to reflectance R s 2 (α2) and p- polarized light to polarized light. The first reflectivity sum R sPE regarding s- polarized light poles edge rays accumulated upon reflection on the first and second deflection mirror is accumulated during the reflection on the first and second deflecting mirror second reflectance on the p- polarized light of the equatorial edge rays sum R p E and substantially equal. .FIELD 2
机译:反射折射投影物镜包括多个光学元件,投影曝光设备,使用这种投影物镜的投影曝光方法并提供镜。折反射投影物镜包括沿光轴排列的多个光学元件,用于将投影物镜的物表面上的阵列图案成像到投影物镜的像面上。光学元件和凹面镜,来自物体表面的光朝着凹面镜偏转,或者相对于第一凹轴的光从凹面镜朝着像面偏转的第一倾斜角包括倾斜的第一偏转镜相对于t 1 的光轴和第二偏转镜,第二偏转镜仅相对于第二倾斜角t 2 的光轴相对于第二倾斜轴倾斜。第一偏转镜以 (t 1-Δα1)≦α 1 <(t 1 +Δα1)第一入射角α 1入射在第一偏转镜上第一入射角范围根据s-相对于反射率 R 具有反射率 R p1(α1)的第一反射涂层Sub> s 1(α1)并将p偏振光转换为偏振光。第二偏转镜从第二入射角02以 (t 2-Δα2)≤α 2≤(t 2 +Δα2)的角度入射到第二偏转镜上。根据s的第二入射角范围-相对于反射率<具有反射率 R p 2(α2)的第二反射涂层Sub> R s 2(α2)和p偏振光变为偏振光。关于在第一和第二偏转镜上反射时累积的关于s-偏振光极边缘光线的第一反射率和R s PE 在赤道边缘光线的p偏振光上的第二反射率镜和 R p E且基本相等。 .FIELD 2

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