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With a carrier copper foil, a manufacturing method of a copper foil with a carrier, a printed circuit board, printed circuit boards, copper-clad laminate, and a method for manufacturing a printed wiring board
With a carrier copper foil, a manufacturing method of a copper foil with a carrier, a printed circuit board, printed circuit boards, copper-clad laminate, and a method for manufacturing a printed wiring board
Is to provide a suitable carrier with copper foil to [challenge] fine pitch formation. [SOLUTION] The copper foil with carrier, after removing the thin copper layer electrode, Thickness A of ultra-thin copper layer before etching and (μm), the value C of the ratio equivalent thickness B of ultra-thin copper layer was removed by etching with (μm) thickness A very thin layer of copper (= before etching (μm equivalent thickness B of ultra-thin copper layer was removed by) / etching (μm)), C = 0.227 × log e (A thickness of ultra-thin copper layer before etching (μm)) + 0.26 When the etching is performed on the separation surface side of the ultra-thin copper layer of the electrode until the copper residue of 10μm diameter or etching the surface of the thin copper layer is 5 pieces / dm 2 or less the poles. [Selection Figure Figure 3
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机译:为铜箔提供合适的载体以挑战细间距的形成。 [解决方案]带载体的铜箔在去除薄铜层电极,蚀刻前的超薄铜层的厚度A和(μm)之后,通过以下方法去除超薄铜层的当量厚度B的比值C。以(μm)厚度进行蚀刻极薄的铜层(=蚀刻前(通过去除(μm)超薄铜层的等效厚度B的微米/蚀刻(μm)),C = 0.227×log e Sub >(蚀刻前的超薄铜层的厚度(μm))+ 0.26在电极的超薄铜层的分离面侧进行蚀刻直至直径10μm的铜残渣或蚀刻表面薄铜层为5个/ dm 2 Sup>极以下。 [选择图图3
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