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Fabrication of High-Throughput Nano-Imprint Lithography Templates

机译:高通量纳米压印光刻模板的制作

摘要

An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρporousfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
机译:压印光刻模板包括限定多个孔的多孔材料,其平均孔径为至少约0.4nm。多孔材料包括硅和氧,并且相对于熔融二氧化硅(ρ多孔熔融二氧化硅),杨氏模量(E)与多孔材料的相对密度之比。 )至少约为10:1。多孔材料的折射率在约1.4至1.5之间。多孔材料可以形成压印光刻模板的中间层或盖层。模板可包括在多孔层和盖层之间的孔密封层,或在盖层的顶部上的孔密封层。

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