MASK BLANK SUBSTRATE, MASK BLANK, REFLECTIVE MASK BLANK, TRANSFER MASK, REFLECTIVE MASK, AND METHOD FOR MAKING THESE

摘要

A mask blank substrate is provided with a substrate mark comprising an oblique section. The inclination angle of the substrate mark with respect to a main surface is greater than 45° and less than 90° and the distance from the boundary between the main surface and the substrate mark to the outer periphery of the mask blank substrate is less than 1.5 mm.