首页> 外国专利> PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT UTILIZING THE COMPOSITION METHOD FOR FORMATION OF RESIST PATTERN, AND PROCESS FOR PRODUCTION OF PRINTED CIRCUIT BOARD

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT UTILIZING THE COMPOSITION METHOD FOR FORMATION OF RESIST PATTERN, AND PROCESS FOR PRODUCTION OF PRINTED CIRCUIT BOARD

机译:光敏树脂组成,利用光阻剂形成方法的光敏元素以及印刷电路板的生产工艺

摘要

Disclosed is a photosensitive resin composition comprising a binder polymer, a photopolymerizable compound having an ethylenically unsaturated bond, and at least one pyrazine compound selected from the group consisting of compounds each having a structure represented by formula (1), compounds each having a structure represented by formula (2) and compounds each having a structure represented by formula (3). [In formulae (1) to (3), R1 to R12 independently represent a univalent organic group containing an alkyl group, a cycloalkyl group, a phenyl group, a naphthyl group or a heterocyclic group, wherein R1 and R2, R3 and R4, R5 and R6, R7 and R8, R9 and R10, or R11 and R12 may be bound to each other and, together with two carbon atoms contained in a pyrazine skeleton, form a ring. In formula (2), X and Y independently represent an atom group that constitutes an aromatic ring formed together with two carbon atoms contained in a pyrazine skeleton and having a monocyclic or condensed polycyclic structure. In formula (3), Z represents an atom group that constitutes an aromatic ring having a monocyclic or condensed polycyclic structure and formed together with four carbon atoms contained in a pyrazine skeleton or a hetero ring.
机译:公开了一种光敏树脂组合物,其包含粘合剂聚合物,具有烯键式不饱和键的光聚合性化合物,以及选自由各自具有式(1)表示的结构的化合物,各自具有由表示结构的化合物组成的组中的至少一种吡嗪化合物。式(2)表示的化合物和具有式(3)表示的结构的化合物。 [在式(1)至(3)中,R 1至R 12独立地表示包含烷基,环烷基,苯基,萘基或杂环基的一价有机基团,其中R 1和R 2,R 3和R 4, R 5和R 6,R 7和R 8,R 9和R 10或R 11和R 12可以彼此键合,并且与吡嗪骨架中包含的两个碳原子一起形成环。在式(2)中,X和Y独立地表示构成与在吡嗪骨架中包含的两个碳原子一起形成并具有单环或稠合多环结构的芳环的原子团。式(3)中,Z表示构成具有单环或稠合多环结构的芳香环并与吡嗪骨架或杂环中所含的四个碳原子一起形成的原子团。

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