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POWER MOSFET, SEMICONDUCTOR DEVICE INCLUDING THE POWER MOSFET, AND METHOD FOR MAKING THE POWER MOSFET

机译:功率MOSFET,包括该功率MOSFET的半导体器件及其制造方法

摘要

metal oxide semiconductor field effect transistor according to the present invention includes a semiconductor substrate; Containing the first conductivity type impurity disposed on a semiconductor substrate, the well region to form by the addition of a second conductivity type impurity at a predetermined interval and a source region and a drain region separated from each other ; The source region and the insulating film disposed on a surface of the well region in the gap between the drain region; And a gate electrode disposed on the insulating film. The well region is made of epitaxial layer , the epitaxial layer comprises an impurity layer of the first conductivity type having different impurity concentrations .
机译:根据本发明的金属氧化物半导体场效应晶体管包括半导体衬底。包含布置在半导体衬底上的第一导电类型杂质,通过以预定间隔添加第二导电类型杂质而形成的阱区域以及彼此分离的源极区域和漏极区域;源极区域和绝缘膜设置在阱区域的表面上的漏极区域之间的间隙中;栅电极设置在绝缘膜上。阱区由外延层制成,外延层包括具有不同杂质浓度的第一导电类型的杂质层。

著录项

  • 公开/公告号KR101392976B1

    专利类型

  • 公开/公告日2014-05-26

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20070096704

  • 发明设计人 마에다 히로키;

    申请日2007-09-21

  • 分类号H01L21/336;H01L29/78;

  • 国家 KR

  • 入库时间 2022-08-21 15:41:00

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