Photo-resist composition, coating method thereof, method for patterning of organic film using the same and display device fabricated thereby

摘要

The present invention is to prevent the coating uniformity is improved to be suitable for application to the substrate and a large stain occurred a photosensitive organic material , and its application method , an organic film pattern forming method using the same , thus relates to a display device to be produced , and mixing the polymer resin of the polysiloxane resin , a photosensitive compound, including the organic solvent , the coating of large substrates in a suitable coating uniformity and improved crush and dirt , stains resin coating by the spin -less coating speed and, at the same time preventing the occurrence of stain , etc. is improved , can be to improve the quality of the final product . ; The photosensitive organic , PR, spin -less coating , polysiloxane resins