SIMULATION OF THE EFFECTS OF GRANILLEE NOISE ON A PARTICLE BEAM LITHOGRAPHY METHOD AND IN PARTICULAR ELECTRONIC LITHOGRAPHY.

摘要

A method of simulating the effects of shot noise on a particle beam lithography process, in particular electronic lithography, the method comprising depositing particles on the surface of a sample in a predetermined pattern by means of a beam of said particles, said pattern being subdivided into pixels and a nominal dose of particles being associated with each said pixel, characterized in that it comprises the calculation of a map σd standard deviation of the normalized dose actually deposited on each said pixel, said standard deviation map being calculated from a map M0 of said nominal dose associated with each pixel and a spreading function of the PSF point characterizing said method; said method being implemented by computer. Computer program product and computer programmed for the implementation of such method. A method of particle beam lithography, and in particular of electronic lithography, comprising a preliminary operation for simulating the effects of shot noise by such a method.