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SIMULATION OF THE EFFECTS OF GRANILLEE NOISE ON A PARTICLE BEAM LITHOGRAPHY METHOD AND IN PARTICULAR ELECTRONIC LITHOGRAPHY.
SIMULATION OF THE EFFECTS OF GRANILLEE NOISE ON A PARTICLE BEAM LITHOGRAPHY METHOD AND IN PARTICULAR ELECTRONIC LITHOGRAPHY.
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机译:模拟格兰尼噪声对粒子束光刻技术和特殊电子光刻技术的影响。
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摘要
The method involves depositing particles on a surface of a sample in a preset pattern by a beam of the particles, where the pattern is subdivided into pixels and a nominal dose of particles is associated with each of the pixels. A map (sigmad) of standard deviation in the normalized dose actually deposited in each of the pixels is calculated from a map (Mo) of the nominal dose associated with each pixel and a point spread function (PSF) characterizing the process, where the method is implemented by computer. Independent claims are also included for the following: (1) a computer program product for implementing a method simulating shot-noise effects in a particle-beam lithography process (2) and a computer programmed to implement a method for simulating shot-noise effects in a particle-beam lithography process.
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