PLASMA CVD FILM DEPOSITING MASK, PLASMA CVD FILM DEPOSITING METHOD, AND ORGANIC ELECTROLUMINESCENT ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD film depositing mask capable of improving uniformity of film thickness at an end, and restraining abnormal discharge, and having corrosion resistance against washing gas.;SOLUTION: A plasma CVD film depositing mask used when a film is deposited on a surface of a deposited material by a plasma CVD film depositing device comprises: a mask member 2 having an opening part 21 and a non-opening part 22; and a metallic member fixed to at least one part of an end 22e of the non-opening part 22 forming the opening 21, and coated with ceramic.;COPYRIGHT: (C)2015,JPO&INPIT