PLASMA CVD FILM DEPOSITING MASK, PLASMA CVD FILM DEPOSITING METHOD, AND ORGANIC ELECTROLUMINESCENT ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD film depositing mask with high uniformity of film thickness at an end, and corrosion resistance against washing gas almost without ingress influences.;SOLUTION: A plasma CVD film depositing mask 1 used when a film is deposited on a surface of a deposited material by a plasma CVD film depositing device comprises: a mask member 2 having a first opening part 21 formed at a predetermined position and a first non-opening part 22 forming the first opening part 21; and a metallic member 3 having a second opening part 31 opened at an almost identical shape to that of the first opening part 21 with a smaller opening dimension than that of the first opening part 21 at the identical opening position to the first opening part 21, and a second non-opening part 32 forming the second opening part 31 and coated with ceramic, and having a smaller thickness dimension that of the mask member 2.;COPYRIGHT: (C)2015,JPO&INPIT