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Organic light-emitting diode for the thin film forming deposition apparatus

机译:用于薄膜形成沉积设备的有机发光二极管

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition device capable of forming continuously and efficiently a uniform thin film with a thickness uniform along a width direction of a base material, on a surface of the tape-like base material.;SOLUTION: The vapor deposition device includes a vapor deposition source 1 provided in an inside of a vacuum deposition chamber 11, a tape-like base material supply means (3) for supplying the tape-like base material 10 for vapor deposition, an ejection outlet 1a for ejecting a vapor deposition material evaporated from the vapor deposition source 1 toward a face to be vapor-deposited of the tape-like base material 10, a base material take-up means (4) for recovering the tape-like base material 10 after vapor-deposited, and a base material supporting means (5) for holding a vapor deposition position of the tape-like base material 10 in a prescribed distance with respect to the ejection outlet 1a of the vapor deposition source 1, and a shielding mask 2 of prescribed shape is attached replaceably to control a deposition amount of a vapor deposition material to the tape-like base material 10, in the ejection outlet 1a of the vapor deposition source 1.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种能够在带状基材的表面上连续且有效地形成沿着基材的宽度方向具有均匀厚度的均匀薄膜的气相沉积装置。沉积装置包括:真空沉积源1,其设置在真空沉积室11的内部;带状基础材料供应装置(3),用于供应用于气相沉积的带状基础材料10;喷射口1a,用于喷射气体。从蒸镀源1向带状基材10的蒸镀面蒸发的蒸镀材料,用于在蒸镀后回收带状基材10的基材卷取装置(4)。以及将带状基材10的蒸镀位置相对于蒸镀源1的喷出口1a保持一定距离的基材支撑机构(5)和屏蔽罩在汽相淀积源1的喷射出口1a中,可替换地安装规定形状的2以控制汽相淀积材料到带状基材10上的淀积量;版权:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP5681496B2

    专利类型

  • 公开/公告日2015-03-11

    原文格式PDF

  • 申请/专利权人 日東電工株式会社;

    申请/专利号JP20110001273

  • 发明设计人 垣内 良平;

    申请日2011-01-06

  • 分类号C23C14/24;

  • 国家 JP

  • 入库时间 2022-08-21 15:31:36

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