Etching simulation device , etching simulation method , program , storage medium .

摘要

PROBLEM TO BE SOLVED: To provide an etching simulation device and the like capable of reducing a cost when generating mask data by performing an etching simulation accurately reflecting a change in a shape of an embossed plate.;SOLUTION: An etching simulation device 1 performs a simulation for etching on height field data (an etching object) 29 using mask data 26 generated by using height field data (texture) 25. In that case, the etching simulation device 1 reflects, on a mask section 26b side, an influence of a side etching in which the etching progresses according to distance from a boundary between the mask section 26b and an opening 26a, to a simulation result based on a side etching profile 27a, and reflects an influence of a round etching whose etching speed varies depending on a corner part that the etching object has, to the simulation result using a round etching profile 27b.;COPYRIGHT: (C)2013,JPO&INPIT