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TRANSFER DEVICE AND TRANSFER METHOD OF SUBSTRATE FOR DEPOSITING COMPOUND SEMICONDUCTOR FILM, AND DEPOSITION SYSTEM AND DEPOSITION METHOD OF COMPOUND SEMICONDUCTOR FILM
TRANSFER DEVICE AND TRANSFER METHOD OF SUBSTRATE FOR DEPOSITING COMPOUND SEMICONDUCTOR FILM, AND DEPOSITION SYSTEM AND DEPOSITION METHOD OF COMPOUND SEMICONDUCTOR FILM
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机译:复合半导体膜沉积物的转移装置及转移方法,复合半导体膜的沉积系统及沉积方法
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摘要
PROBLEM TO BE SOLVED: To provide a transfer device and a transfer method of a substrate for depositing a compound semiconductor film capable of automatically transferring a substrate for depositing a compound semiconductor film, by eliminating the impact of particles or the problem of transfer to the substrate rear surface or undesired deposition on the substrate rear surface.;SOLUTION: A transfer device 170 has a support 70 for supporting a substrate holder 40, a lifting member 91 capable of lifting and lowering a substrate at a substrate holding part 80 of the substrate holder 40, and a shield member 82 which is lifted and lowered with lifting and lowering of the lifting member 91, interposed between the substrate W and the lifting member 91 when the lifting member 91 receives the substrate, and shields a hole 81 into which the lifting member 91 of the substrate holder 40 is inserted, on the rear side of the substrate W when the substrate is held at the substrate holding part. In a state where the lifting member 91 is lifted, the substrate W is mounted on the shield member 82, or the substrate W on the shield member 82 is transported by a transport device 201.;COPYRIGHT: (C)2015,JPO&INPIT
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