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首页> 外文期刊>Journal of materials science >Hydrothermal-electrochemical deposition of semiconductor thin films: the case of CuIn(Al)Se_2 compound
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Hydrothermal-electrochemical deposition of semiconductor thin films: the case of CuIn(Al)Se_2 compound

机译:半导体薄膜的水热电化学沉积:CuIn(Al)Se_2化合物的情况

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摘要

Electrochemical deposition of CuIn(Al)Se_2 thin film from quaternary aqueous solution of Cu, In, Al and Se salts has been carried out at different temperatures (25, 55 and 80 ℃) and it was found that optical properties, crystallinity and phase purity of the as-deposited CuIn(Al) Se_2 films are enhanced at higher temperature. Consequently, electrodeposition of CuIn(Al)Se_2 under hydro-thermal condition at high temperature (120℃) and at different potentials is performed. The characterization of the obtained layers indicates that single phase chalcopyrite film could be deposited by synergism of the electrodeposition and hydrothermal methods at optimized deposition potential (—600 mV). Superior photoconductivity has also been observed in case of electrodeposited layer at 120℃ (hydrothermal condition). More interestingly, post annealing of CIAS thin film prepared by developed procedure at 200 ℃ (ambient atmosphere) results in dense microcrystal-line layer with a photoconductivity 300 times higher than the sample deposited at room temperature.
机译:在不同温度(25、55和80℃)下,从Cu,In,Al和Se盐的四元水溶液中电化学沉积CuIn(Al)Se_2薄膜,发现其光学性质,结晶度和相纯度较高温度下,沉积的CuIn(Al)Se_2薄膜的数量增加。因此,在高温(120℃)和不同电势下,在水热条件下进行了CuIn(Al)Se_2的电沉积。所获得的层的特征表明,可以通过电沉积和水热方法的协同作用以最佳沉积电位(-600 mV)沉积单相黄铜矿膜。在120℃(水热条件)下电沉积层的情况下,也观察到了优异的光电导性。更有趣的是,通过发达的程序在200℃(环境气氛)下对CIAS薄膜进行后退火,得到致密的微晶线层,其光电导率比室温下沉积的样品高300倍。

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  • 来源
    《Journal of materials science 》 |2017年第20期| 15596-15604| 共9页
  • 作者单位

    Materials and Energy Research Center, RO. Box 14155-4777, Tehran, Iran,Department of Chemistry, NIS and INSTM Reference Centre, Universita di Torino, Via P. Giuria 7, 10125 Torino, Italy;

    Department of Chemistry, NIS and INSTM Reference Centre, Universita di Torino, Via P. Giuria 7, 10125 Torino, Italy;

    Materials and Energy Research Center, RO. Box 14155-4777, Tehran, Iran;

    Department of Chemistry, NIS and INSTM Reference Centre, Universita di Torino, Via P. Giuria 7, 10125 Torino, Italy;

    Materials and Energy Research Center, RO. Box 14155-4777, Tehran, Iran;

    Materials and Energy Research Center, RO. Box 14155-4777, Tehran, Iran;

    Materials and Energy Research Center, RO. Box 14155-4777, Tehran, Iran;

    Materials and Energy Research Center, RO. Box 14155-4777, Tehran, Iran;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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