Lighting system for a focused spot size of the settling maskless lithography patterning system

摘要

It seems like the mask less lithography projection system, the optical system in order to make the pattern of focus spot, the illuminating, has the pattern generator and the image formation device. The illuminating the illuminant in order to generate the light beam, has the homogenizer because light is made to disperse equally into the light beam and the condenser in order to connect the illuminant to the homogenizer. The pattern generator has the control possible element individually it illuminates by the light beam from the illuminating. The image formation device, conjugation in order to form focus spot, image formation can point to the control possible element of the pattern generator to each aperture contraction of the image formation device and the illuminating on the focus element which corresponds. The illuminating in order to reduce the size of focus spot makes the image formation device aperture contraction under filling. The condenser size of focus spot and in order furthermore to control form makes the illuminating aperture contraction under filling.