Illumination system for sizing focused spots of a patterning system for maskless lithography

摘要

maskless lithography projection systems such as condensed spots of the pattern for the creation of a the optical system comprises a light pattern generator, and an imager. The lighting includes a capacitor for coupling the light source, the light beam heading for evenly distributing the light in the homogenizer, and a light source for generating a light beam to homo homogenizer. A pattern generator has an individually addressable light modulation of the light beam from the illumination device. Imager and Image the addressable elements of the pattern generator to the corresponding focusing elements for forming a condensed spot bonded to the aperture stop in the low illumination. The lighting underfill an imager aperture stop to reduce the size of the focused spot. The capacitor underfill illumination aperture stop to further control the size and shape of the focused spot. ;