首页> 外国专利> RESISTIVE SWITCHING MEMORY DEVICE HAVING IMPROVED NONLINEARITY AND METHOD OF FABRICATING THE SAME

RESISTIVE SWITCHING MEMORY DEVICE HAVING IMPROVED NONLINEARITY AND METHOD OF FABRICATING THE SAME

机译:具有改善的非线性的电阻开关存储器件及其制造方法

摘要

A nonvolatile resistive switching memory (ReRAM) device having no selection device is provided. The ReRAM device includes a lower electrode that is formed on on a substrate; a metal oxide layer that is formed on the lower electrode, the metal oxide layer having a resistive switching characteristic; an upper electrode that is formed on the metal oxide layer; and a tunnel barrier oxide film that is formed between the lower electrode and the metal oxide layer, thereby forming a double oxide film structure, the tunnel barrier oxide film being made of a material, a band energy gap and a conduction band offset of which are lower than those of the metal oxide layer, and which does not cause interface switching.
机译:提供了一种不具有选择装置的非易失性电阻式开关存储器(ReRAM)装置。 ReRAM装置包括形成在基板上的下部电极;以及下部电极。在下部电极上形成的金属氧化物层,该金属氧化物层具有电阻切换特性。在金属氧化物层上形成的上电极;形成在下部电极和金属氧化物层之间的隧道势垒氧化膜,从而形成双重氧化膜结构,该隧道势垒氧化膜由带隙和导带偏移为低于金属氧化物层的金属氧化物,并且不会引起界面切换。

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