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METHOD OF MANUFACTURING HIGH POWER VERTICAL GaN-PIN DIODE
METHOD OF MANUFACTURING HIGH POWER VERTICAL GaN-PIN DIODE
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机译:制造高功率垂直GaN-PIN二极管的方法
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摘要
Compared with the typical Si and GaAs material, a wide bandgap material (III-N compound) has the better electronic properties, particularly the operation stability and the temperature sensitivity, and is extremely suitable for the high power electronic application. The invention proposes a high power vertical GaN device for providing the reverse breakdown voltage higher than or equal to 600 V, the lower on-resistance is lower than or equal to 5 mΩ-cm2 and the forward current as high as 3 A/mm2.
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机译:与典型的Si和GaAs材料相比,宽带隙材料(III-N化合物)具有更好的电子性能,特别是操作稳定性和温度敏感性,并且非常适合大功率电子应用。本发明提出了一种高功率垂直GaN器件,其提供反向击穿电压大于或等于600V,较低的导通电阻小于或等于5mΩ-cm 2 Sup>和正向电流。高达3 A / mm 2 Sup>。
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