首页> 外国专利> ENHANCING SCHOTTKY BREAKDOWN VOLTAGE (BV) WITHOUT AFFECTING AN INTEGRATED MOSFET-SCHOTTKY DEVICE LAYOUT

ENHANCING SCHOTTKY BREAKDOWN VOLTAGE (BV) WITHOUT AFFECTING AN INTEGRATED MOSFET-SCHOTTKY DEVICE LAYOUT

机译:增强肖特基击穿电压(BV)而不影响集成的MOSFET-肖特基器件布局

摘要

This invention discloses a semiconductor power device that includes an active cell area having a plurality of power transistor cells. Each of said power transistor cells has a planar Schottky diode that includes a Schottky junction barrier metal covering areas above gaps between separated body regions between two adjacent power transistor cells. The separated body regions further provide a function of adjusting a leakage current of said Schottky diode in each of said power transistor cells. Each of the planar Schottky diodes further includes a Shannon implant region disposed in a gap between the separated body regions of two adjacent power transistor cells for further adjusting a leakage current of said Schottky diode. Each of the power transistor cells further includes heavy body doped regions in the separated body regions next to source regions surrounding said Schottky diode forming a junction barrier Schottky (JBS) pocket region.
机译:本发明公开了一种半导体功率器件,其包括具有多个功率晶体管单元的有源单元区域。每个所述功率晶体管单元具有平面肖特基二极管,其包括肖特基结势垒金属,其覆盖两个相邻的功率晶体管单元之间的分离的主体区域之间的间隙上方的区域。分离的主体区域还具有调节每个所述功率晶体管单元中的所述肖特基二极管的泄漏电流的功能。每个平面肖特基二极管还包括香农注入区,该香农注入区设置在两个相邻的功率晶体管单元的分离的体区之间的间隙中,以进一步调节所述肖特基二极管的泄漏电流。每个功率晶体管单元还包括重质掺杂区,该重质掺杂区位于分离的体区中,紧接围绕所述肖特基二极管的源极区,从而形成结势垒肖特基(JBS)口袋区。

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