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High reverse breakdown voltage Schottky rectifiers without edge termination on Ga_2O_3

机译:高反向击穿电压肖特基整流器,Ga_2O_3上没有边缘终端

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摘要

Vertical geometry Ni/Au-β-Ga_2O_3 Schottky rectifiers were fabricated on Hydride Vapor Phase Epitaxy layers on conducting bulk substrates, and the rectifying forward and reverse current-voltage characteristics were measured at temperatures in the range of 25-100 ℃. The reverse breakdown voltage (V_(BR)) of these β-Ga_2O_3 rectifiers without edge termination was a function of the diode diameter, being in the range of 920-1016 V (average value from 25 diodes was 975 ± 40 V, with 10 of the diodes over 1 kV) for diameters of 105 µm and consistently 810 V (810 ± 3 V for 22 diodes) for a diameter of 210 µm. The Schottky barrier height decreased from 1.1 at 25℃ to 0.94 at 100 ℃, while the ideality factor increased from 1.08 to 1.28 over the same range. The figure-of-merit (V_(BR)~2/R_(on)), where R_(on) is the on-state resistance (~6.7 mΩ cm~2), was approximately 154.07 MW-cm~(-2) for the 105 µm diameter diodes. The reverse recovery time was 26 ns for switching from +5 V to -5 V. These results represent another impressive advance in the quality of bulk and epitaxial β~Ga_2O_3.
机译:在导电块状衬底上的氢化物气相外延层上制备了垂直几何形状的Ni /Au-β-Ga_2O_3肖特基整流器,并在25-100℃的温度范围内测量了正向和反向电流-电压特性。这些没有边缘端接的β-Ga_2O_3整流器的反向击穿电压(V_(BR))是二极管直径的函数,范围为920-1016 V(25个二极管的平均值为975±40 V,其中10个二极管直径105 µm的1 kV以上的二极管)和直径210 µm的810 V(22个二极管为810±3 V)。在相同范围内,肖特基势垒高度从25℃下的1.1降低到100℃下的0.94,而理想因子从1.08升高到1.28。品质因数(V_(BR)〜2 / R_(on))约为154.07 MW-cm〜(-2),其中R_(on)为通态电阻(〜6.7mΩcm〜2) )用于直径为105 µm的二极管。从+5 V切换到-5 V的反向恢复时间为26 ns。这些结果代表了块状和外延β〜Ga_2O_3的质量的又一个令人印象深刻的进步。

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  • 来源
    《Applied Physics Letters》 |2017年第19期|192101.1-192101.4|共4页
  • 作者单位

    Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA;

    Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA;

    Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA;

    Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611, USA;

    Department of Chemical Engineering, Dankook University, Yongin 16890, South Korea;

    Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, South Korea;

    Tamura Corporation and Novel Crystal Technology, Inc., Sayama, Saitama 350-1328, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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