首页> 外国专利> Arrays Of Recessed Access Gate Lines, Arrays Of Conductive Lines, Arrays Of Recessed Access Gate Lines And Conductive Lines, Memory Circuitry, Methods Of Forming An Array Of Recessed Access Gate Lines, Methods Of Forming An Array Of Conductive Lines, And Methods Of Forming An Array Of Recessed Access Gate Lines And An Array Of Conductive Lines

Arrays Of Recessed Access Gate Lines, Arrays Of Conductive Lines, Arrays Of Recessed Access Gate Lines And Conductive Lines, Memory Circuitry, Methods Of Forming An Array Of Recessed Access Gate Lines, Methods Of Forming An Array Of Conductive Lines, And Methods Of Forming An Array Of Recessed Access Gate Lines And An Array Of Conductive Lines

机译:凹入式检修门线阵列,导电线阵列,凹入式检修门线阵列和导电线阵列,存储器电路,形成凹入式检修门线阵列的方法,形成导电线阵列的方法以及形成导电线的方法凹入式检修门线阵列和导电线阵列

摘要

An array of recessed access gate lines includes active area regions having dielectric trench isolation material there-between. The trench isolation material comprises dielectric projections extending into opposing ends of individual active area regions under an elevationally outermost surface of material of the active area regions. The active area material is elevationally over the dielectric projections. Recessed access gate lines individually extend transversally across the active area regions and extend between the ends of immediately end-to-end adjacent active area regions within the dielectric trench isolation material. Other arrays are disclosed, as are methods.
机译:凹入的访问栅极线的阵列包括有源区域区域,在有源区域区域之间具有电介质沟槽隔离材料。沟槽隔离材料包括电介质突起,该电介质突起延伸到有源区域区域的材料的高度最外表面下方的各个有源区域区域的相对端中。有源区材料在电介质凸起上方垂直放置。凹进的访问栅线分别横向地跨过有源区区域延伸,并在介电沟槽隔离材料内的紧邻的首尾相连的相邻有源区区域的末端之间延伸。公开了其他阵列以及方法。

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