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Ultra-thin metal oxide and carbon-metal oxide films prepared by atomic layer deposition (ALD)
Ultra-thin metal oxide and carbon-metal oxide films prepared by atomic layer deposition (ALD)
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机译:通过原子层沉积(ALD)制备的超薄金属氧化物和碳金属氧化物薄膜
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摘要
Ultra-thin porous films are deposited on a substrate in a process that includes laying down an organic polymer, inorganic material or inorganic-organic material via an atomic layer deposition or molecular layer deposition technique, and then treating the resulting film to introduce pores. The films are characterized in having extremely small thicknesses of pores that are typically well less than 50 nm in size.
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