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AG base alloy thin film and sputtering target for forming AG base alloy thin film

机译:AG基合金薄膜和用于形成AG基合金薄膜的溅射靶

摘要

The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.
机译:银合金膜技术领域本发明涉及银合金膜。特别地,优选用作在光信息记录介质领域中具有高导热率/高反射率/高耐久性的光信息记录介质的反射膜或半透射反射膜,Ag聚集性优异的电磁屏蔽膜。电阻,以及反射型液晶显示装置的背面上的光学反射膜等。本发明的Ag合金膜包括Ag基合金,该Ag基合金含有总量为0.005至10%(以原子%计)的Bi和/或Sb。此外,本发明涉及用于沉积这种Ag合金膜的溅射靶。

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