首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Optical and electrical properties of pure Ag and Ag-based alloy thin films prepared by RF magnetron sputtering
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Optical and electrical properties of pure Ag and Ag-based alloy thin films prepared by RF magnetron sputtering

机译:射频磁控溅射制备纯Ag和Ag基合金薄膜的光电性能

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摘要

Ag and Ag-(0.9 wt%)Pd-(1.0 wt%)Cu (APC) alloy films were deposited on glass substrates by RF magnetron sputtering. The reflectance of Ag films deposited at room temperature was 98% at a wavelength of 600 nm. However, it decreased with increasing substrate temperature due to crystal grain growth and film surface roughening. The resistivity of pure Ag films with thickness of 100 nm was about 2 muOmega cm, which is almost equivalent to that of bulk Ag (1.6 muOmega cm), while 95% of reflectance and 3 muOmega cm of resistivity were obtained in the case of APC film. (C) 2002 Elsevier Science Ltd. All rights reserved. [References: 4]
机译:通过RF磁控溅射在玻璃基板上沉积Ag和Ag-(0.9wt%)Pd-(1.0wt%)Cu(APC)合金膜。在室温下沉积的Ag膜在600nm的波长下的反射率为98%。但是,由于晶粒的生长和膜表面的粗糙化,它随衬底温度的升高而降低。厚度为100 nm的纯Ag膜的电阻率约为2μOmegacm,几乎等于块状Ag(1.6μOmegacm)的电阻率,而在APC的情况下,可获得95%的反射率和3μOmegacm的电阻率电影。 (C)2002 Elsevier ScienceLtd。保留所有权利。 [参考:4]

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